Open AccessПолучение текстурированных пленок FeCo(110) и FeCo(200) магнетронным распылением на постоянном токе
Author(s) -
A. S. Dzhumaliev,
V. K. Sakharov
Publication year - 2022
Publication title -
fizika tverdogo tela
Language(s) - English
Resource type - Journals
eISSN - 1726-7498
pISSN - 0367-3294
DOI - 10.21883/ftt.2022.02.51940.222
Subject(s) - texture (cosmology) , materials science , substrate (aquarium) , sputter deposition , sputtering , thin film , nanotechnology , computer science , oceanography , artificial intelligence , image (mathematics) , geology
The results of study of bias voltage Ub and substrate temperature Ts influence on the texture of FeCo films with the thickness of 180 nm deposited on Si/SiO2 substrates by DC magnetron sputtering are presented. It is shown that the change of Ub from -250 V to ~ 80 V leads to the growth of films with (110) texture. Further change of Ub from 80 V to 250 V causes the growth of films having (200) texture. Films deposited at Ub = 0 and Ts = 60º – 300º C have (200) texture. Further increase of Ts results in the change of film texture to (110).