Open AccessСоздание тонких пленок NbN при комнатной температуре подложки
Author(s) -
Б.А. Гурович,
Б.В. Гончаров,
К.Е. Приходько,
Л.В. Кутузов,
Л.В. Столяров,
Е.М. Малиева
Publication year - 2021
Publication title -
fizika tverdogo tela
Language(s) - English
Resource type - Journals
eISSN - 1726-7498
pISSN - 0367-3294
DOI - 10.21883/ftt.2021.09.51245.35h
Subject(s) - materials science , annealing (glass) , sapphire , sputter deposition , critical current , thin film , transition layer , superconductivity , sputtering , optoelectronics , atmospheric temperature range , substrate (aquarium) , layer (electronics) , transition temperature , nanotechnology , condensed matter physics , composite material , optics , physics , laser , oceanography , geology , meteorology
Thin NbN films were prepared by magnetron sputtering. The films were prepared on sapphire substrates at temperatures of 20–300 ° C. Superconducting transition temperature for different samples, depending on the substrate temperature during deposition was 8–14 K. The density of the critical current jc lies in the range of 0.8−8 MA / cm2, which allows the usage of these films for creation of multilayer structures, due to the absence of annealing, to which each underlying layer with structures is exposed when sputtered next.