Open AccessФеноменологические модели зарождения и роста металла на полупроводнике
Author(s) -
Н.И. Плюснин
Publication year - 2019
Publication title -
fizika tverdogo tela
Language(s) - English
Resource type - Journals
eISSN - 1726-7498
pISSN - 0367-3294
DOI - 10.21883/ftt.2019.12.48567.07ks
Subject(s) - materials science , wetting , substrate (aquarium) , metal , chemical vapor deposition , deposition (geology) , semiconductor , kinetic energy , coating , chemical engineering , composite material , metallurgy , nanotechnology , optoelectronics , physics , paleontology , oceanography , quantum mechanics , sediment , engineering , biology , geology
Four modes of metal growth on a semiconductor substrate were found based on an analysis of experimental data obtained under identical experimental conditions during the deposition from a hot wall. These modes are realized at certain ratios between the translational kinetic energy of the vapor deposited on the substrate and its temperature. A growth mechanism and a structural model of the adaptation of a nanophase wetting metal coating to a substrate during the implementation of a pure metal growth mode are proposed.