
Микроструктура и механические свойства многослойных alpha-AlN/alpha-BCN-покрытий в зависимости от плотности тока при распылении мишени B-=SUB=-4-=/SUB=-C
Author(s) -
Александр Дмитриевич Погребняк,
В. И. Иващенко,
Н.К. Ердыбаева,
А. И. Купчишин,
M. Lisovenko
Publication year - 2018
Publication title -
fizika tverdogo tela
Language(s) - English
Resource type - Journals
eISSN - 1726-7498
pISSN - 0367-3294
DOI - 10.21883/ftt.2018.10.46528.113
Subject(s) - knoop hardness test , materials science , amorphous solid , annealing (glass) , coating , argon , sputter deposition , crystallinity , composite material , sputtering , crystallography , analytical chemistry (journal) , chemical engineering , nanotechnology , indentation hardness , thin film , chemistry , microstructure , organic chemistry , engineering
Multilayer AlN/BCN coating of nanometer scale have been prepared by magnetron sputtering of Al and B_4C targets in an argon–nitrogen atmosphere during deposition on a Si substrate. These coating have an X-ray amorphous structure and the maximum Knoop hardness of 27 GPa (at the current density 100 mA). The first-principle molecular dynamics calculations show that the B4–BN layer is dynamically unstable; thus, it will not be epitaxial and will be amorphous or have a structure different from the B4–BN structure. The thermal vacuum annealing from 600 to 800°C of samples with multilayer nanosized coating leads to the decrease in the Knoop hardness to 18 GPa; however, the coating structure is retained X-ray amorphous.