
Исследование влияния особенностей конструкции установки магнетронного распыления на электрические и оптические свойства пленок оксида индия-олова
Author(s) -
Д.А. Кудряшов,
А.А. Максимова,
Е.А. Вячеславова,
А.В. Уваров,
И.А. Морозов,
А.И. Баранов,
А.О. Монастыренко,
А.С. Гудовских
Publication year - 2021
Publication title -
fizika i tehnika poluprovodnikov
Language(s) - English
Resource type - Journals
eISSN - 1726-7315
pISSN - 0015-3222
DOI - 10.21883/ftp.2021.04.50741.9561
Subject(s) - materials science , electrical resistivity and conductivity , indium tin oxide , homogeneity (statistics) , substrate (aquarium) , oxide , oxygen , wavelength , analytical chemistry (journal) , optics , optoelectronics , thin film , chemistry , nanotechnology , metallurgy , physics , statistics , mathematics , oceanography , organic chemistry , quantum mechanics , chromatography , geology
The influence of the relative position of the magnetron and the substrate on the electrical and optical properties of the forming indium tin oxide (ITO) layers is demonstrated. The reasons for this behavior are considered and the role of oxygen in the onset of inhomogeneity of the properties of ITO films is shown. It is shown that, in the growth mode without additional oxygen addition, the resistivity of ITO films differs by an order of magnitude ((2−14)·10^−2 Ohm·cm) for different positions of the substrate on the substrate holder along the radius in the range of 0−14cm. In this case, absorption spectra are observed differences in the shape of the short-wavelength region of the spectrum. The addition of an insignificant (0.1sccm) amount of oxygen to the working chamber during the growth of the oxide leads to a significant increase in the homogeneity of the electrical and optical properties of ITO