Формирование многослойных структур с интегрированными мембранами на основе пористого кремния | Zendy

В.В. Болотов | Zendy; К.Е. Ивлев | Zendy; Е.В. Князев | Zendy; И.В. Пономарева | Zendy; В.Е. Росликов | Zendy

AI Assistant Blog Pricing

Home ZAIA Blog

Open Access

Формирование многослойных структур с интегрированными мембранами на основе пористого кремния

Author(s) -

В.В. Болотов,

К.Е. Ивлев,

Е.В. Князев,

И.В. Пономарева,

В.Е. Росликов

Publication year - 2020

Publication title -

физика и техника полупроводников

Language(s) - English

Resource type - Journals

eISSN - 1726-7315

pISSN - 0015-3222

DOI - 10.21883/ftp.2020.05.49269.9340

Subject(s) - membrane , materials science , ammonium hydroxide , silicon , porous silicon , chemical engineering , electrolyte , layer (electronics) , porosity , potassium hydroxide , nanotechnology , chemistry , composite material , electrode , optoelectronics , biochemistry , engineering

Multilayer integrated porous membranes in a monolithic frame were obtained. Porous membranes consist of macroporous silicon with pore diameters of up to 10 μm and channel silicon with channel diameters from 100 to 300 nm. A laboratory technology is proposed to formation of macroporous/channel silicon two-layer structures using high-resistance n-Si substrates (1 Ohm•cm). The mechanism of pore formation is discussed and how this mechanism affects the morphology of porous layers when formic acid and ammonium hydroxide are used as electrolytes.

The content you want is available to Zendy users.

Already have an account? Click here to sign in.

Having issues? You can contact us here

Accelerating Research