Open AccessНаноструктурированные покрытия ITO/SiO-=SUB=-2-=/SUB=-
Author(s) -
L. K. Markov,
А.С. Павлюченко,
I. P. Smirnova
Publication year - 2019
Publication title -
fizika i tehnika poluprovodnikov
Language(s) - English
Resource type - Journals
eISSN - 1726-7315
pISSN - 0015-3222
DOI - 10.21883/ftp.2019.08.47994.9135
Subject(s) - materials science , indium tin oxide , layer (electronics) , whiskers , coating , sputtering , sputter deposition , electrical conductor , optoelectronics , transparent conducting film , composite material , thin film , nanotechnology
AbstractThe influence of a SiO_2 layer deposited onto nanostructured transparent conductive films of indium and tin oxide (ITO) on their optical characteristics is investigated. For this purpose, SiO_2 films of various thicknesses are deposited by magnetron sputtering on samples with ITO films containing whiskers of preferentially vertical orientation and possessing steadily decreasing reflectance. It is shown that this makes it possible to attain noticeable coating antireflection under the condition of the uniform overgrowth of ITO whiskers by the SiO_2 layer. The influence of the SiO_2 layer on the optical characteristics of a dense unstructured ITO film is also investigated. The results for structured and unstructured ITO/SiO_2 coatings with identical material mass contents are compared. It is noted that due to the liability of ITO material to degradation during operation in the composition of transparent conductive contacts, the results can also be interesting for the formation of coatings more resistant to the effect of the environment.