Open AccessОбразование дефектов в структурах GaAs с непокрытой и покрытой пленкой AlN поверхностями при имплантации ионов азота и последующем отжиге
Author(s) -
Н. А. Соболев,
В.И. Сахаров,
И.Т. Серенков,
А. Д. Бондарев,
К.В. Карабешкин,
Е. В. Фомин,
А.Е. Калядин,
В.М. Микушкин,
Е.И. Шек,
Е. В. Шерстнев
Publication year - 2019
Publication title -
žurnal tehničeskoj fiziki
Language(s) - English
Resource type - Journals
eISSN - 1726-748X
pISSN - 0044-4642
DOI - 10.21883/ftp.2019.04.47435.9038
Subject(s) - annealing (glass) , ion , materials science , ion implantation , crystallographic defect , epitaxy , nitrogen , sputtering , atom (system on chip) , analytical chemistry (journal) , crystallography , thin film , chemistry , nanotechnology , metallurgy , layer (electronics) , organic chemistry , chromatography , computer science , embedded system
The concentration profiles of defects produced in structures upon the implantation of nitrogen ions into GaAs epitaxial layers with an uncovered surface and that covered with an AlN film and subsequent annealing are studied. The ion energies and the implantation doses are chosen so that the nitrogen-atom concentration profiles coincided in structures of both types. Rutherford proton backscattering spectra are measured in the random and channeling modes, and the concentration profiles of point defects formed are calculated for the samples under study. It is found that the implantation of nitrogen ions introduces nearly the same number of point defects into structures of both types, and the formation of an AlN film by ion-plasma sputtering is accompanied by the formation of an additional number of defects. However, the annealing of structures of both types leads to nearly the same concentrations of residual defects.