Open AccessФормирование нанопористых пленок силицидов меди
Author(s) -
Э.Ю. Бучин,
В.В. Наумов,
С.В. Васильев
Publication year - 2019
Publication title -
fizika i tehnika poluprovodnikov
Language(s) - English
Resource type - Journals
eISSN - 1726-7315
pISSN - 0015-3222
DOI - 10.21883/ftp.2019.03.47297.8972
Subject(s) - kirkendall effect , materials science , annealing (glass) , nanoporous , silicide , chemical engineering , metastability , copper , porosity , metallurgy , crystallography , nanotechnology , silicon , composite material , chemistry , organic chemistry , engineering
The possibility of forming nanoporous copper-silicide films with different phase compositions is experimentally demonstrated. For this purpose, the parameters of the initial a -Si/Cu structure and the conditions of its annealing are chosen so that the process of solid-phase synthesis comes to a halt at the stage of formation of a branched silicide cluster. Then the films are subjected to liquid etching in a mixture of diluted inorganic acids. In this case, the metastable Cu_ x Si phase with a low Cu content is selectively removed, and a three-dimensional silicide cluster is released. At the same time, surface Kirkendall voids present in the films open. As a result of these two processes in combination, a nanoporous structure is formed.