Open AccessВыращивание методом МОС-гидридной эпитаксии субмонослойных квантовых точек InGaAs/GaAs для возбуждения поверхностных плазмон-поляритонов
Author(s) -
Н.В. Байдусь,
В. А. Кукушкин,
С. М. Некоркин,
А. В. Круглов,
D. G. Reunov
Publication year - 2019
Publication title -
fizika i tehnika poluprovodnikov
Language(s) - English
Resource type - Journals
eISSN - 1726-7315
pISSN - 0015-3222
DOI - 10.21883/ftp.2019.03.47286.8999
Subject(s) - photoluminescence , materials science , optoelectronics , quantum dot , epitaxy , molecular beam epitaxy , schottky diode , polarization (electrochemistry) , diode , nanotechnology , chemistry , layer (electronics)
The properties of InGaAs/GaAs quantum dots (QDs) grown by MOS-hydride migration-stimulated epitaxy at a reduced pressure using submonolayer deposition are investigated. The wavelength of their photoluminescence at 300 K is in the range of 1.28–1.31 μm and can be controlled by varying the growth temperature and the number of QD-deposition cycles. The highest QD surface density is 3 × 10^10 cm^–2. Structures with 1–3 QD layers and spacer layers 5–12 nm thick between them are grown. The spacer layers (as well as the cap layers) are selectively doped with carbon (acceptor). It is established that the QD photoluminescence is characterized by an enhanced degree of polarization in the direction orthogonal to the structure plane. This should favor their use for the excitation of surface plasmon–polaritons in Schottky light-emitting diodes.