Исследование структурных и морфологических свойств HPHT алмазных подложек | Zendy

П.А. Юнин | Zendy; П. В. Волков | Zendy; Ю Н Дроздов | Zendy; А.В. Колядин | Zendy; С. А. Королев | Zendy; Д.Б. Радищев | Zendy; Е.А. Суровегина | Zendy; V. I. Shashkin | Zendy

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Исследование структурных и морфологических свойств HPHT алмазных подложек

Author(s) -

П.А. Юнин,

П. В. Волков,

Ю Н Дроздов,

А.В. Колядин,

С. А. Королев,

Д.Б. Радищев,

Е.А. Суровегина,

V. I. Shashkin

Publication year - 2018

Publication title -

физика и техника полупроводников

Language(s) - English

Resource type - Journals

eISSN - 1726-7315

pISSN - 0015-3222

DOI - 10.21883/ftp.2018.11.46592.14

Subject(s) - diamond , epitaxy , chemical vapor deposition , materials science , characterization (materials science) , substrate (aquarium) , optical microscope , diffraction , diamond type , atomic force microscopy , interference microscopy , nanotechnology , microscopy , optoelectronics , material properties of diamond , optics , composite material , scanning electron microscope , geology , layer (electronics) , oceanography , physics

The morphological and structural properties of a series of high-pressure high-temperature (HPHT) single-crystal diamond substrates are comprehensively studied by white-light optical interference microscopy, atomic-force microscopy, and X-ray diffraction analysis. Procedures that provide a means for characterizing the substrate parameters most critical for epitaxial application with the laboratory equipment are described. It is shown that the jewelry-type characterization of diamond substrates is insufficient to assess the possibility of their use for the epitaxial growth of chemical-vapor-deposited (CVD) diamond.

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