Open AccessStudy on fabrication method of composite oxide by room temperature atomic layer deposition
Author(s) -
Fumihiko Hirose
Publication year - 2020
Publication title -
impact
Language(s) - English
Resource type - Journals
eISSN - 2398-7081
pISSN - 2398-7073
DOI - 10.21820/23987073.2020.5.16
Subject(s) - atomic layer deposition , thin film , corrosion , materials science , deposition (geology) , nanotechnology , layer (electronics) , fabrication , oxide , composite number , engineering physics , metallurgy , composite material , engineering , medicine , paleontology , alternative medicine , pathology , sediment , biology
Thin films can be used to improve the surface properties of materials, enhancing elements such as absorption, abrasion resistance and corrosion resistance, for example. These thin films provide the foundation for a variety of applications in various fields and their applications depend on their morphology and stability, which is influenced by how they are deposited. Thin films can be deposited in different ways. One of these is a technology called atomic layer deposition (ALD). Professor Fumihiko Hirose, a scientist based at the Graduate School of Science and Engineering, Yamagata University, Japan, is conducting research on the room temperature ALD of oxide metals. Along with his team, Professor Hirose has developed a new and improved way of performing ALD to create thin films, and the potential applications are endless.