Open AccessCharacterization Modeling of the Flow Through Ion Gun: Applications to Nitride Processing
Author(s) -
Darcie L. Dennis
Publication year - 2003
Language(s) - English
Resource type - Reports
DOI - 10.2172/817229
Subject(s) - ion , deposition (geology) , materials science , thin film , boron nitride , characterization (materials science) , substrate (aquarium) , analytical chemistry (journal) , sputtering , plasma , volumetric flow rate , chemical physics , chemistry , nanotechnology , mechanics , physics , paleontology , oceanography , organic chemistry , chromatography , quantum mechanics , sediment , geology , biology
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