Open AccessSilicon field emission points for vacuum IC's by wet chemical etching
Author(s) -
Charles E. Hunt,
Joshua Trujillo
Publication year - 1990
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/7032264
Subject(s) - microelectronics , field electron emission , fabrication , etching (microfabrication) , silicon , materials science , integrated circuit , optoelectronics , isotropic etching , field (mathematics) , nanotechnology , physics , electron , mathematics , layer (electronics) , pure mathematics , medicine , alternative medicine , pathology , quantum mechanics
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