Open AccessChemical vapor deposition of amorphous semiconductor films. Semiannual report, 1 May 1983-31 October 1984
Author(s) -
B. N. Baron,
Richard Rocheleau,
Steven Hegedus
Publication year - 1984
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/6928072
Subject(s) - chemical vapor deposition , semiconductor , amorphous solid , materials science , amorphous semiconductors , deposition (geology) , optoelectronics , voltage , chemistry , electrical engineering , geology , crystallography , engineering , silicon , paleontology , sediment
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