Open AccessPhotochemical vapor deposition of amorphous silicon photovoltaic devices: Annual subcontract report, 1 May 1985-30 April 1986
Author(s) -
B. N. Baron,
Richard Rocheleau,
Steven Hegedus
Publication year - 1987
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/6587014
Subject(s) - disilane , chemical vapor deposition , amorphous silicon , materials science , optoelectronics , silicon , photovoltaic system , deposition (geology) , photosensitivity , photochemistry , amorphous solid , chemistry , crystalline silicon , organic chemistry , ecology , paleontology , sediment , biology
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