Open AccessPhysical sputtering of candidate plasma-side materials for FED/INTOR
Author(s) -
J Roberto
Publication year - 1983
Language(s) - English
Resource type - Reports
DOI - 10.2172/6567910
Subject(s) - sputtering , ion , plasma , materials science , atomic physics , angle of incidence (optics) , chemistry , physics , thin film , nuclear physics , nanotechnology , optics , organic chemistry