Open AccessDemonstration of feasibility of depositing semiconductor layers using microwave enhanced plasma techniques. Quarterly technical report, June 1-September 1, 1984
Publication year - 1984
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/6151732
Subject(s) - silane , fluidized bed , silicon , microwave , decomposition , materials science , deposition (geology) , process engineering , semiconductor , pyrolysis , waste management , chemical engineering , nuclear engineering , environmental science , engineering , optoelectronics , chemistry , telecommunications , paleontology , organic chemistry , sediment , biology
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