Open AccessDeep-etch x-ray lithography at the ALS: First results
Author(s) -
C. Khan Malek,
K.H. Jackson,
Reid A. Brennen
Publication year - 1997
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/603689
Subject(s) - liga , electroforming , lithography , x ray lithography , resist , materials science , ion beam lithography , fabrication , collimated light , nanotechnology , optics , optoelectronics , physics , laser , medicine , alternative medicine , pathology , layer (electronics)
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