Chemistry and physics of silicon-based amorphous semiconductors
Author(s) -
Matthew Brodsky,
Brian L. Scott
Publication year - 1984
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/5924367
Subject(s) - silane , silicon , materials science , remote plasma , amorphous silicon , amorphous solid , semiconductor , plasma , engineering physics , analytical chemistry (journal) , nanotechnology , chemistry , optoelectronics , physics , crystalline silicon , crystallography , composite material , nuclear physics , chemical vapor deposition , chromatography
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