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Study of microcrystalline, silicon-carbon p-layers prepared by photo-CVD and glow discharge
Author(s) -
H. Schade
Publication year - 1989
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/5492126
Subject(s) - microcrystalline , conductivity , materials science , absorbance , silicon , glow discharge , analytical chemistry (journal) , chemical vapor deposition , photoconductivity , deposition (geology) , open circuit voltage , layer (electronics) , optoelectronics , chemistry , nanotechnology , voltage , plasma , crystallography , paleontology , physics , chromatography , quantum mechanics , sediment , biology

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