Open AccessEvaluating electrically insulating films deposited on V-4% Cr-4% Ti by reactive CVD
Author(s) -
J.H. Park,
W.D. Cho
Publication year - 1997
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - Uncategorized
Resource type - Reports
DOI - 10.2172/543273
Subject(s) - vanadium , materials science , scanning electron microscope , analytical chemistry (journal) , ohmic contact , chemical vapor deposition , alloy , semiconductor , electrical resistivity and conductivity , vanadate , metallurgy , composite material , chemistry , nanotechnology , optoelectronics , engineering , chromatography , layer (electronics) , electrical engineering
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