Amorphous hydrogenated silicon germanium alloys suitable for photoelectronic applications. Annual subcontract report, 1 July 1984-30 Jun 1985
Author(s) -
W. Paul
Publication year - 1985
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - Uncategorized
Resource type - Reports
DOI - 10.2172/5330415
Subject(s) - germanium , photoconductivity , materials science , glow discharge , amorphous silicon , substrate (aquarium) , silicon , amorphous solid , fluorine , band gap , deposition (geology) , solar cell , optoelectronics , analytical chemistry (journal) , engineering physics , crystalline silicon , metallurgy , chemistry , crystallography , plasma , physics , chromatography , quantum mechanics , sediment , biology , geology , paleontology , oceanography
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