z-logo
open-access-imgOpen Access
Determination of ionization fraction and plasma potential in a dc magnetron sputtering system using a quartz crystal microbalance and a gridded energy analyzer
Author(s) -
K.M. Green
Publication year - 1997
Language(s) - English
Resource type - Reports
DOI - 10.2172/531049
Subject(s) - quartz crystal microbalance , feedthrough , materials science , sputter deposition , ionization , analytical chemistry (journal) , plasma , sputtering , ion , atomic physics , optoelectronics , chemistry , thin film , nanotechnology , physics , organic chemistry , adsorption , chromatography , quantum mechanics

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom