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Determination of ionization fraction and plasma potential in a dc magnetron sputtering system using a quartz crystal microbalance and a gridded energy analyzer
Author(s) -
Karyn M. Green
Publication year - 1997
Language(s) - English
Resource type - Reports
DOI - 10.2172/531049
Subject(s) - quartz crystal microbalance , feedthrough , materials science , sputter deposition , ionization , analytical chemistry (journal) , plasma , sputtering , ion , atomic physics , optoelectronics , chemistry , thin film , nanotechnology , physics , organic chemistry , adsorption , chromatography , quantum mechanics

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