Open AccessOrganic etch capability of various gas plasmas
Author(s) -
C. T. Fritsche
Publication year - 1990
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/5234634
Subject(s) - plasma , epoxy , materials science , analytical chemistry (journal) , plasma etching , oxygen , environmental chemistry , chemistry , composite material , organic chemistry , etching (microfabrication) , layer (electronics) , physics , nuclear physics
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