Deposition of amorphous silicon solar cells at high rates by glow discharge of disilane. Final subcontract report, January 1985-July 1986
Author(s) -
P. E. Vanier
Publication year - 1986
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/5050928
Subject(s) - disilane , silane , amorphous silicon , solar cell , substrate (aquarium) , materials science , dopant , glow discharge , doping , amorphous solid , deposition (geology) , silicon , layer (electronics) , optoelectronics , open circuit voltage , thin film , chemical engineering , chemistry , nanotechnology , crystalline silicon , voltage , composite material , electrical engineering , crystallography , physics , engineering , oceanography , biology , paleontology , plasma , quantum mechanics , sediment , geology
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