Open AccessSystem for deposition and hydriding of thin metallic films without air exposure
Author(s) -
Chad C. Eichman,
Jonathan P. Comeau,
K. R. Rinehuls
Publication year - 1974
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/4269106
Subject(s) - scandium , materials science , electrical resistivity and conductivity , substrate (aquarium) , titanium , deposition (geology) , thin film , metal , metallurgy , analytical chemistry (journal) , composite material , chemistry , nanotechnology , electrical engineering , paleontology , sediment , geology , oceanography , chromatography , biology , engineering
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