Low temperature annealing of electron irradiated germanium
Author(s) -
W. D. Hyatt
Publication year - 1970
Language(s) - English
Resource type - Reports
DOI - 10.2172/4104181
Subject(s) - vacancy defect , germanium , dopant , irradiation , silicon , annealing (glass) , impurity , electron beam processing , activation energy , materials science , analytical chemistry (journal) , doping , acceptor , lattice (music) , crystallography , atomic physics , chemistry , condensed matter physics , metallurgy , nuclear physics , optoelectronics , physics , organic chemistry , chromatography , acoustics
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom