Open AccessTemperature changes in thin films during growth by physical vapor deposition
Author(s) -
D. D. Thornburg
Publication year - 1971
Language(s) - English
Resource type - Reports
DOI - 10.2172/4053122
Subject(s) - samarium , thin film , deposition (geology) , chemical vapor deposition , materials science , oxygen , chemical engineering , combustion chemical vapor deposition , chemistry , analytical chemistry (journal) , inorganic chemistry , nanotechnology , carbon film , organic chemistry , geology , paleontology , sediment , engineering
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom