Open AccessCHEMICAL VAPOR DEPOSITION PROCESS EQUIPMENT. Progress through November 1970.
Author(s) -
G.J. Hale
Publication year - 1971
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - Uncategorized
Resource type - Reports
DOI - 10.2172/4008271
Subject(s) - doping , grain boundary , impurity , crystallite , analytical chemistry (journal) , electrical resistivity and conductivity , materials science , hall effect , chemical vapor deposition , grain size , electron mobility , sapphire , crystal (programming language) , condensed matter physics , mineralogy , chemistry , nanotechnology , optics , metallurgy , optoelectronics , microstructure , physics , laser , organic chemistry , chromatography , quantum mechanics , computer science , programming language
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