Open AccessInfluence of Plasma Species on the Growth Mode and Material Properties of Indium Nitride Grown by Plasma-Assisted Atomic Layer Epitaxy.
Author(s) -
J. Woodward,
Samantha G. Rosenberg,
David R. Boris,
Scooter D. Johnson,
Zachary R. Robinson,
Michael A. Mastro,
Karl Ludwig,
C. E. Eddy,
J. Hite
Publication year - 2021
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Conference proceedings
DOI - 10.2172/1862766
Subject(s) - metastability , annealing (glass) , molecular beam epitaxy , plasma , nitride , materials science , ion , indium , epitaxy , blueshift , optoelectronics , analytical chemistry (journal) , layer (electronics) , chemistry , nanotechnology , photoluminescence , metallurgy , physics , organic chemistry , quantum mechanics , chromatography
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