Open AccessParticle-in-Cell Modeling of Low Pressure Capacitively Coupled Plasmas for High Aspect Ratio Etching
Author(s) -
Amanda Lietz,
Shahid Rauf,
Jason Kenney,
Peng Tian,
Matthew Hopkins
Publication year - 2022
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/1853881
Subject(s) - capacitively coupled plasma , particle in cell , etching (microfabrication) , plasma etching , plasma , aspect ratio (aeronautics) , materials science , particle (ecology) , analytical chemistry (journal) , optoelectronics , nanotechnology , chemistry , inductively coupled plasma , physics , nuclear physics , environmental chemistry , geology , oceanography , layer (electronics)
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