Low-Temperature Processing for Atomically Precise Dopant Incorporation with CMOS Integration.
Author(s) -
Scott Schmucker,
Evan M. Anderson,
Esther Frederick,
Jeffrey Ivie,
Ezra Bussmann,
DeAnna Campbell,
Lisa Tracy,
TzuMing Lu,
Ping Lu,
George Wang,
Daniel R. Ward,
Shashank Misra
Publication year - 2020
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Conference proceedings
DOI - 10.2172/1830910
Subject(s) - dopant , cmos , materials science , optoelectronics , dopant activation , temperature measurement , doping , computer science , engineering physics , electronic engineering , physics , engineering , quantum mechanics
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