Open AccessLDRD 191204: Optimization of Sputtered Aluminum Nitride for the Seeding of Metal Organic Chemical Vapor Deposition Gallium Nitride Films
Author(s) -
Katherine E. Knisely
Publication year - 2018
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/1474019
Subject(s) - materials science , nitride , sapphire , metalorganic vapour phase epitaxy , nucleation , optoelectronics , chemical vapor deposition , doping , sputtering , thin film , metallurgy , composite material , layer (electronics) , nanotechnology , epitaxy , optics , chemistry , laser , physics , organic chemistry
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