Open AccessDevelopment of Critical Technologies of Soft X-Ray Lithography Final Report CRADA No. TC-0503-93
Author(s) -
D. R. Kania,
David F. Kyser,
W. D. Meisburger,
Hiroshi Suzuki,
John H. Bruning,
N. P. Economou
Publication year - 2018
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/1430945
Subject(s) - lithography , nanotechnology , materials science , x ray , physics , optoelectronics , optics
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