z-logo
open-access-imgOpen Access
Chemical Vapor Deposition Growth. Final Report, December 29, 1975 -- August 31, 1977
Author(s) -
R. P. Ruth,
H. M. Manasevit,
Andrew G. Campbell,
R. E. Johnson,
J. L. Kenty,
L. A. Moudy,
G.L. Shaw,
W. I. Simpson,
J. J. Yang
Publication year - 1978
Language(s) - Uncategorized
Resource type - Reports
DOI - 10.2172/12205306
Subject(s) - fabrication , chemical vapor deposition , dichlorosilane , solar cell , materials science , silane , substrate (aquarium) , deposition (geology) , characterization (materials science) , silicon , process development , nanotechnology , chemical engineering , process engineering , optoelectronics , composite material , engineering , sediment , geology , medicine , paleontology , oceanography , alternative medicine , pathology , biology

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom