Superconductive silicon nanowires using gallium beam lithography.
Author(s) -
Michael David Henry
Publication year - 2014
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - Uncategorized
Resource type - Reports
DOI - 10.2172/1147604
Subject(s) - nanowire , materials science , ohmic contact , silicon , niobium , electrical resistivity and conductivity , optoelectronics , focused ion beam , gallium , nanotechnology , metallurgy , ion , electrical engineering , layer (electronics) , chemistry , engineering , organic chemistry
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