Open AccessPulsed Plasma with Synchronous Boundary Voltage for Rapid Atomic Layer Etching
Author(s) -
Demetre J. Economou,
Vincent M. Donnelly
Publication year - 2014
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/1130983
Subject(s) - etching (microfabrication) , plasma etching , monolayer , plasma , layer (electronics) , materials science , substrate (aquarium) , nanotechnology , optoelectronics , electrode , waveform , biasing , voltage , chemistry , electrical engineering , engineering , physics , oceanography , quantum mechanics , geology
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