Open AccessEtching of UO<sub>2</sub> in NF<sub>3</sub> RF Plasma Glow Discharge
Author(s) -
John M. Veilleux
Publication year - 1999
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/10597
Subject(s) - analytical chemistry (journal) , plasma , etching (microfabrication) , glow discharge , chemistry , materials science , nuclear chemistry , chromatography , composite material , physics , quantum mechanics , layer (electronics)
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