Open AccessThe Energetic Neutral Atom Beam Lithography & Epitaxy (ENABLE) Capability at LANL
Author(s) -
Mark A. Hoffbauer
Publication year - 2012
Language(s) - English
Resource type - Reports
DOI - 10.2172/1043513
Subject(s) - characterization (materials science) , raman spectroscopy , lithography , actinide , scanning electron microscope , materials science , atom (system on chip) , spectroscopy , diffraction , electron beam lithography , nanotechnology , analytical chemistry (journal) , optoelectronics , chemistry , optics , physics , resist , nuclear chemistry , computer science , quantum mechanics , chromatography , composite material , embedded system , layer (electronics)
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