Open AccessChemical vapor deposition of copper for integrated circuits. Final CRADA project report
Author(s) -
Not Given Author
Publication year - 1994
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/10130179
Subject(s) - copper , chemical vapor deposition , integrated circuit , deposition (geology) , electronic circuit , materials science , chemistry , environmental science , environmental chemistry , nanotechnology , optoelectronics , metallurgy , engineering , electrical engineering , geology , paleontology , sediment
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