Open AccessAnalysis of vapors produced during ultraviolet light exposure of photolithography resist-coated silicon wafers by gas chromatography/mass spectrometry: Final report
Author(s) -
Not Given Author
Publication year - 1997
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/10129737
Subject(s) - wafer , photolithography , resist , ultraviolet , mass spectrometry , silicon , materials science , gas chromatography , gas chromatography–mass spectrometry , chromatography , analytical chemistry (journal) , chemistry , optoelectronics , nanotechnology , layer (electronics)
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