Open AccessINVESTIGATION OF THE EFFECT OF ETCHING CURRENT ON TEXTURED SILICON SURFACE FOR FORMING POROUS SILICON LAYERS ACTING AS AN ANTI-REFLECTION COATING.
Author(s) -
H.M. Abd-Elrasol,
M.A. Farag,
G.M. Youssef,
H.A. Elzahed
Publication year - 2022
Publication title -
international journal of advanced research
Language(s) - English
Resource type - Journals
ISSN - 2320-5407
DOI - 10.21474/ijar01/14568
Subject(s) - materials science , porous silicon , silicon , etching (microfabrication) , current density , scanning electron microscope , optoelectronics , porosity , open circuit voltage , coating , short circuit , composite material , band gap , reflection (computer programming) , optics , layer (electronics) , voltage , physics , quantum mechanics , computer science , programming language
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