Open AccessMAGNETIC FIELD REGULATION IN THE RETUNED MAGNETRON SPUTTERING SYSTEM WITH A TARGET OF FINAL SIZES
Author(s) -
Aleksei G. Dyakonov,
Ramil K. Fattakhov
Publication year - 2018
Publication title -
vestnik irkutskogo gosudarstvennogo tehničeskogo universiteta
Language(s) - English
Resource type - Journals
eISSN - 2500-1590
pISSN - 1814-3520
DOI - 10.21285/1814-3520-2018-1-159-167
Subject(s) - magnetic field , sputtering , plasma , sputter deposition , cavity magnetron , field (mathematics) , acoustics , materials science , mechanical engineering , computational physics , computer science , physics , engineering , mathematics , nanotechnology , thin film , nuclear physics , quantum mechanics , pure mathematics