Open AccessStudy of the electrical properties of Ion Beam Sputtered thin AlNiCo films
Author(s) -
T.K. Al-Ani
Publication year - 2007
Publication title -
mağallaẗ baġdād li-l-ʿulūm
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.167
H-Index - 6
eISSN - 2411-7986
pISSN - 2078-8665
DOI - 10.21123/bsj.4.2.260-262
Subject(s) - alnico , materials science , ion , ion beam , thin film , optoelectronics , nanotechnology , chemistry , electrical engineering , magnet , engineering , organic chemistry
The electrical properties of the AlNiCo thin films with thickness (1000oA) deposited on glass substrates using Ion – Beam sputtering (IBS) technique under vacuum