Open AccessSpectral Ellipsometry as a Method of Investigation of Influence of Rapid Thermal Processing of Silicon Wafers on their Optical Characteristics
Author(s) -
В. А. Солодуха,
U. A. Pilipenko,
A. A. Omelchenko,
Dmitry V. Shestovski
Publication year - 2022
Publication title -
pribory i metody izmerenij
Language(s) - English
Resource type - Journals
eISSN - 2414-0473
pISSN - 2220-9506
DOI - 10.21122/2220-9506-2022-13-3-199-207
Subject(s) - silicon , materials science , ellipsometry , wafer , doping , rapid thermal processing , optics , strained silicon , absorption (acoustics) , optoelectronics , analytical chemistry (journal) , crystalline silicon , chemistry , thin film , nanotechnology , composite material , physics , chromatography , amorphous silicon