Open AccessDevelopment of Bipolar Electrostatic Chuck with a Beam-Array Assembly Fabricated by Lithography
Author(s) -
Yuki Taoka,
Ken−ichi Kawabata,
Pasomphone Hemthavy,
SungYool Choi,
Kunio Takahashi,
Shigeki Saito
Publication year - 2022
Publication title -
international journal of automation technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.513
H-Index - 18
eISSN - 1883-8022
pISSN - 1881-7629
DOI - 10.20965/ijat.2022.p0471
Subject(s) - materials science , deep reactive ion etching , lithography , electron beam lithography , engraving , beam (structure) , etching (microfabrication) , surface finish , optics , surface roughness , optoelectronics , nanotechnology , resist , reactive ion etching , composite material , layer (electronics) , physics