Open AccessEffect of Argon-Oxygen Flow Rate Ratio in Magnetron Sputtering on Morphology and Hygroscopic Property of SnO2 Thin Film
Author(s) -
Muhammad Faris Shahin Shahidan,
R. Awang
Publication year - 2016
Publication title -
international journal of electrochemical science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.346
H-Index - 82
ISSN - 1452-3981
DOI - 10.20964/2016.08.45
Subject(s) - argon , materials science , morphology (biology) , sputter deposition , thin film , oxygen , volumetric flow rate , sputtering , flow (mathematics) , analytical chemistry (journal) , chemical engineering , nanotechnology , chemistry , environmental chemistry , mechanics , geology , physics , organic chemistry , paleontology , engineering
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