Open AccessInfluence of the Cerium Oxide Thin Film Produc-Tion Methods on the Capacitance-Voltage Charac-Teristics of the Mis Structures
Author(s) -
Liubomyr Mykolaiovych Korolevych,
Natalia Maksimchuk,
Oleksandr Vasyliovych Borysov
Publication year - 2019
Publication title -
mìkrosistemi, elektronìka ta akustika
Language(s) - English
Resource type - Journals
eISSN - 2523-4455
pISSN - 2523-4447
DOI - 10.20535/2523-4455.2019.24.3.178484
Subject(s) - materials science , dielectric , thin film , semiconductor , capacitance , optoelectronics , cerium , silicon , gate dielectric , insulator (electricity) , voltage , electronic engineering , electrical engineering , nanotechnology , chemistry , electrode , metallurgy , transistor , engineering