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Hydrogen Peroxide Measurements by MISFET and LET Structures with Rear Porous Silicon Layer and Metallic Nanoparticles
Author(s) -
Oksana Yuriivna Kutova,
Tetyana Obukhova,
Mykhailo Dusheiko,
Bogdan Oleksiyovych Loboda,
T. I. Borodinova,
S. V. Tkach
Publication year - 2018
Publication title -
mìkrosistemi, elektronìka ta akustika
Language(s) - English
Resource type - Journals
eISSN - 2523-4455
pISSN - 2523-4447
DOI - 10.20535/2523-4455.2018.23.5.141665
Subject(s) - misfet , porous silicon , materials science , etching (microfabrication) , silicon , isotropic etching , optoelectronics , nanoparticle , hydrogen peroxide , nanotechnology , layer (electronics) , substrate (aquarium) , field effect transistor , chemical engineering , transistor , chemistry , electrical engineering , organic chemistry , oceanography , voltage , geology , engineering

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